Decades of cutting-edge laser, optics and plasma physics research at Lawrence Livermore National Laboratory (LLNL) played a key role in the underlying science that the semiconductor industry uses to manufacture advanced microprocessors. Now a new research partnership led by LLNL aims to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography, centered around a Lab-developed driver system dubbed the Big Aperture Thulium (BAT) laser.
LLNL plasma physicists, Brendan Reagan and Jackson Williams, are the project’s co-lead principal investigators. The project includes scientists from SLAC National Accelerator Laboratory; ASML San Diego; and the Advanced Research Center for Nanolithography (ARCNL), a public-private research center based in the Netherlands.
