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Metalens-enabled TPP printing

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Reference Number
IL-13643, IL-14010, IL-14011
Technical Overview

LLNL has been at the forefront in developing two-photon polymerization (TPP) additive manufacturing (AM) method.  In 2018, LLNL was a recipient of a Federal Laboratory Consortium (FLC) award for their development of FemtoProWrite, which leverages TPP.  TPP is a laser light-directed writing technique in which crosslinking reactions initiated by light lead to a change from liquid to solid within a region that is smaller than the light spot.  The method is very high resolution, capable of fabricating micro- and nano-scale features. 

However, conventional TPP AM printers have extremely slow printing speeds with limited part size since they utilize a single laser spot approach where the laser is directed through a conventional microscope objective and the 3D printed part is built by scanning within the resin material.  There is a market need to maintain the high sub-micron printing resolution offered by TPP, while increasing the throughput and dimensions of the printed components.

Description

LLNL researchers have developed a parallelized TPP system that combines metalens array and spatial light modulator (SLM) to manipulate the directed laser light, which enables high-volume fabrication of nano-architected structures at wafer-scale.  Instead of using a single microscope objective, LLNL’s approach uses an array of metalens that the laser passes through with each metalens being independently controlled via a SLM.  This parallelization of printing allows for large scale, high throughput writing of periodic and non-repeating patterns that exceed the capabilities of conventional TPP platforms.  This novel approach significantly increases throughput without sacrificing resolution or introducing stitching errors.

Image Caption: Metalens Array used for massively parallel Two-Photon Polymerization (TPP)

Metalens Array used for massively parallel Two-Photon Polymerization (TPP)
Development Status

Current stage of technology development: 

TRL  0-2      3-5     ☐ 5-9 

LLNL has filed for patent protection on this invention.

U.S. Patent Application No. 2022/0252761System and method for parallel two-photon lithography using a metalens array published 8/11/2022 

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Advantages
  1. 1000X speed compared to currently available TPP printers
  2. Wafer-scale
  3. 100 nm-resolution
  4. Free of stitching defects
Potential Applications

Using the fine resolution of submicron AM, the technology can be used in a wide variety of fields to fabricate functional micro- and nanoscale 3D structures for photonic crystals, micro-optics, mechanical metamaterials, micro fluidics, miniaturized optics, flexible micro-electronics, Micro-electromechanical Systems (MEMS), on-demand 3D chip packaging solutions, custom micro-heatsinks for the next-generation semiconductor and high-density 3D optical memory. TPP can also be used to produce architected materials for energy solutions (e.g., battery and CO2 electrolyzer electrodes) and biomedical engineering (e.g., neural probes).