LLNL’s invention is a photopolymerizable polymer resin that consists of one or more nitrile-functional based polymers. The resin is formulated for SLA based 3D printing allowing for the production of nitrile-containing polymer components that can then be thermally processed into a conductive, highly graphitic materials. The novelty of the invention lies in (1) the photo-curable nitrile-…
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LLNL researchers have developed a fabrication process for creating 3D random interdigitated architectures of anodes and cathodes, eliminating the need for a membrane to separate them. This approach is similar to the repeating interdigitated multi-electrode architectures that also were developed at LLNL.
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LLNL researchers have developed novel advanced manufactured biomimetic 3D-TPMS (triply periodic minimal surface) membrane architectures such as a 3D gyroid membrane. The membrane is printed using LLNL's nano-porous photoresist technology. LLNL’s 3D-TPMS membranes consist of two independent but interpenetrating macropore flow channel systems that are separated by a thin nano-porous wall. 3D-…
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Improving the active material of the Zn anode is critical to improving the practicality of Zn-MnO2 battery technology. LLNL researchers have developed a new category of 3D structured Zn anode using a direct-ink writing (DIW) printing process to create innovative hierarchical architectures. The DIW ink, which is a gel-based mixture composed of zinc metal powder and organic binders, is extruded…
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The approach is to build a high voltage insulator consisting of two materials: Poly-Ether-Ether-Ketone (“PEEK”) and Machinable Ceramic (“MACOR”). PEEK has a high stress tolerance but cannot withstand high temperatures, while MACOR has high heat tolerance but is difficult to machine and can be brittle. MACOR is used for the plasma-facing surface, while PEEK will handle the stresses and high…
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LLNL’s approach is to use their patented Photoconductive Charge Trapping Apparatus (U.S. Patent No. 11,366,401) as the active switch needed to discharge voltage across a vacuum gap in a particle accelerator, like the one described in their other patent (U.S. Patent No.