This LLNL invention is comprised of (1) a volumetric subtractive manufacturing system which can tomographically manufacture 3D structures with negative features (materials in negative space is degraded with light exposure), and (2) a hybrid volumetric additive/subtractive manufacturing system in which a gelled/solid structure is printed by resin material polymerization using one light, and…
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The approach is to build a high voltage insulator consisting of two materials: Poly-Ether-Ether-Ketone (“PEEK”) and Machinable Ceramic (“MACOR”). PEEK has a high stress tolerance but cannot withstand high temperatures, while MACOR has high heat tolerance but is difficult to machine and can be brittle. MACOR is used for the plasma-facing surface, while PEEK will handle the…
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LLNL’s approach is to use their patented Photoconductive Charge Trapping Apparatus (U.S. Patent No. 11,366,401) as the active switch needed to discharge voltage across a vacuum gap in a particle accelerator, like the one described in their other patent (U.S. Patent No.
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LLNL has developed a system and method that accomplishes volumetric fabrication by applying computed tomography (CT) techniques in reverse, fabricating structures by exposing a photopolymer resin volume from multiple angles, updating the light field at each angle. The necessary light fields are spatially and/or temporally multiplexed, such that their summed energy dose in a target resin volume…