For this method, a Silicon on Insulator (SOI) wafer is used to tailor etch rates and thickness in initial steps of the process. The simple three step process approach is comprised of grayscale lithography, deep reactive-ion etch (DRIE) and liftoff of the SOI wafer. The liftoff process is used to dissolve the insulating layer, thus separating sections of the wafer as individual…
Image
CRETIN is a 1D, 2D, and 3D non-local thermodynamic equilibrium (NLTE) atomic kinetics/radiation transport code which follows the time evolution of atomic populations and photon distributions as radiation interacts with a plasma consisting of an arbitrary mix of elements. It can provide detailed spectra for comparing with experimental diagnostics.
Image
Simrev is a python library imported into a user-generated program. As the program grows in capability and complexity, the engineered product matures. The "software twin" handles all changes to product configuration and is the portal to running supercomputing analysis and managing workflow for engineering simulation codes. Assemblies become program modules; parts, materials, boundary conditions…