LLNL’s invention is a photopolymerizable polymer resin that consists of one or more nitrile-functional based polymers. The resin is formulated for SLA based 3D printing allowing for the production of nitrile-containing polymer components that can then be thermally processed into a conductive, highly graphitic materials. The novelty of the invention lies in (1) the photo-curable nitrile-…
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![Picture of SLA printed structures using 3D printable nitrile-containing photopolymer resins](/sites/default/files/styles/scale_exact_400x400_/public/2024-04/SLA%20printed%20structures%20using%203D%20printable%20nitrile-containing%20photopolymer%20resins.jpg?itok=cVxxoNNY)
![CT Scanner Adobe Stock Image](/sites/default/files/styles/scale_exact_400x400_/public/2024-03/CT%20Scanner.jpeg?itok=tHCxNWpA)
The essence of this invention is a method that couples network architecture using neural implicit representations coupled with a novel parametric motion field to perform limited angle 4D-CT reconstruction of deforming scenes.
![Printed TPMS membrane structures using nanoporous photoresist](/sites/default/files/styles/scale_exact_400x400_/public/2023-12/Printed%20TPMS%20membrane%20structures.png?itok=siH1EwC9)
LLNL researchers have developed novel advanced manufactured biomimetic 3D-TPMS (triply periodic minimal surface) membrane architectures such as a 3D gyroid membrane. The membrane is printed using LLNL's nano-porous photoresist technology. LLNL’s 3D-TPMS membranes consist of two independent but interpenetrating macropore flow channel systems that are separated by a thin nano-porous wall. 3D-…
![SEM image of a prototype for a neural implant shuttle etched into a non-SOI wafer. The 7:1 (Si:Photoresist) etch selectivity used here allowed for a maximum structure height of 32 μm, with up to 75 steps of 0.4 μm height each. Scale bar 100 μm.](/sites/default/files/styles/scale_exact_400x400_/public/2023-05/SEM%20image%20prototype%20neural%20implant%20shuttle.png?itok=fpnfB5Yr)
For this method, a Silicon on Insulator (SOI) wafer is used to tailor etch rates and thickness in initial steps of the process. The simple three step process approach is comprised of grayscale lithography, deep reactive-ion etch (DRIE) and liftoff of the SOI wafer. The liftoff process is used to dissolve the insulating layer, thus separating sections of the wafer as individual silicon…
![Livermore Tomography Tools LTT](/sites/default/files/styles/scale_exact_400x400_/public/2022-06/LTT.jpg?itok=cQE9Kpef)
To solve these challenges using new and existing CT system designs, LLNL has developed an innovative software package for CT data processing and reconstruction. Livermore Tomography Tools (LTT) is a modern integrated software package that includes all aspects of CT modeling, simulation, reconstruction, and analysis algorithms based on the latest research in the field. LTT contains the most…
![microcantilever3.jpg microcantilever3](/sites/default/files/styles/scale_exact_400x400_/public/2019-08/microcantilever3.jpg?itok=NKaBhMlG)
LLNL has developed a compact and low-power cantilever-based sensor array, which has been used to detect various vapor-phase analytes. For further information on the latest developments, see the article "Sniffing the Air with an Electronic Nose."