LLNL’s invention is a photopolymerizable polymer resin that consists of one or more nitrile-functional based polymers. The resin is formulated for SLA based 3D printing allowing for the production of nitrile-containing polymer components that can then be thermally processed into a conductive, highly graphitic materials. The novelty of the invention lies in (1) the photo-curable nitrile-…
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![Picture of SLA printed structures using 3D printable nitrile-containing photopolymer resins](/sites/default/files/styles/scale_exact_400x400_/public/2024-04/SLA%20printed%20structures%20using%203D%20printable%20nitrile-containing%20photopolymer%20resins.jpg?itok=cVxxoNNY)
![Printed TPMS membrane structures using nanoporous photoresist](/sites/default/files/styles/scale_exact_400x400_/public/2023-12/Printed%20TPMS%20membrane%20structures.png?itok=siH1EwC9)
LLNL researchers have developed novel advanced manufactured biomimetic 3D-TPMS (triply periodic minimal surface) membrane architectures such as a 3D gyroid membrane. The membrane is printed using LLNL's nano-porous photoresist technology. LLNL’s 3D-TPMS membranes consist of two independent but interpenetrating macropore flow channel systems that are separated by a thin nano-porous wall. 3D-…
![SEM image of a prototype for a neural implant shuttle etched into a non-SOI wafer. The 7:1 (Si:Photoresist) etch selectivity used here allowed for a maximum structure height of 32 μm, with up to 75 steps of 0.4 μm height each. Scale bar 100 μm.](/sites/default/files/styles/scale_exact_400x400_/public/2023-05/SEM%20image%20prototype%20neural%20implant%20shuttle.png?itok=fpnfB5Yr)
For this method, a Silicon on Insulator (SOI) wafer is used to tailor etch rates and thickness in initial steps of the process. The simple three step process approach is comprised of grayscale lithography, deep reactive-ion etch (DRIE) and liftoff of the SOI wafer. The liftoff process is used to dissolve the insulating layer, thus separating sections of the wafer as individual silicon…
![drift_meter_thumb.jpg drift_meter_thumb](/sites/default/files/styles/scale_exact_400x400_/public/2019-08/drift_meter_thumb.jpg?itok=1NiNsyHm)
LLNL’s Optically-based Interstory Drift Meter System provides a means to accurately measure the dynamic interstory drift of a vibrating building (or other structure) during earthquake shaking. This technology addresses many of the shortcomings associated with traditional strong motion accelerometer based building monitoring.
LLNL’s discrete diode position sensitive device is a newly…
![microcantilever3.jpg microcantilever3](/sites/default/files/styles/scale_exact_400x400_/public/2019-08/microcantilever3.jpg?itok=NKaBhMlG)
LLNL has developed a compact and low-power cantilever-based sensor array, which has been used to detect various vapor-phase analytes. For further information on the latest developments, see the article "Sniffing the Air with an Electronic Nose."
![Electronic Wave](/sites/default/files/styles/scale_exact_400x400_/public/2022-06/electronic%20wave.jpg?itok=v7aKMJKH)
The invention relates to a measurement method and system for capturing both the amplitude and phase temporal profile of a transient waveform or a selected number of consecutive waveforms having bandwidths of up to about 10 THz in a single shot or in a high repetition rate mode. The invention consists of an optical preprocessor which can then output a time-scaled replica of the input signal to…