LLNL researchers have developed additive manufactured fuel targets for IFE.  They have been successful in using TPL to fabricate low density (down to 60 mg/cm3) and low atomic number (CHO) polymeric foams for potential targets, and some have been tested at the OMEGA Laser Facility. With TPL, LLNL researchers have also been able to fabricate a full fuel capsule with diameter of ~ 5mm or…

For this method, a Silicon on Insulator (SOI) wafer is used to tailor etch rates and thickness in initial steps of the process.  The simple three step process approach is comprised of grayscale lithography, deep reactive-ion etch (DRIE) and liftoff of the SOI wafer.  The liftoff process is used to dissolve the insulating layer, thus separating sections of the wafer as individual…