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Various monolith design concepts

The approach is to use foundational materials science, structural design, thermal analysis, optic fabrication, and space systems engineering, and to use optimize them through large-scale simulation to realize meter-scale telescopes at 10X cost reduction.  LLNL’s folded Gregorian design integrates all alignment sensitive components into one static monolithic system.  Like solid-…

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SEM image of a prototype for a neural implant shuttle etched into a non-SOI wafer. The 7:1 (Si:Photoresist) etch selectivity used here allowed for a maximum structure height of 32 μm, with up to 75 steps of 0.4 μm height each. Scale bar 100 μm.

For this method, a Silicon on Insulator (SOI) wafer is used to tailor etch rates and thickness in initial steps of the process.  The simple three step process approach is comprised of grayscale lithography, deep reactive-ion etch (DRIE) and liftoff of the SOI wafer.  The liftoff process is used to dissolve the insulating layer, thus separating sections of the wafer as individual…