LLNL researchers have developed a technology suite that includes several methods for detecting trace levels of illicit drugs even in mixtures. These methods can be used as a rapid screening test for incoming samples; for the samples that were determined to contain detectable amounts, they would undergo final verification using conventional laboratory analytical techniques.
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For this method, a Silicon on Insulator (SOI) wafer is used to tailor etch rates and thickness in initial steps of the process. The simple three step process approach is comprised of grayscale lithography, deep reactive-ion etch (DRIE) and liftoff of the SOI wafer. The liftoff process is used to dissolve the insulating layer, thus separating sections of the wafer as individual…