LLNL researchers have developed a TDLAS-based, standalone, real-time gas analyzer in a small form-factor for continuous or single-point monitoring.  The system can analyze multiple gases with ultra-high sensitivity (ppm detection levels) in harsh conditions when utilizing wavelength-modulation spectroscopy (WMS). 

For this method, a Silicon on Insulator (SOI) wafer is used to tailor etch rates and thickness in initial steps of the process.  The simple three step process approach is comprised of grayscale lithography, deep reactive-ion etch (DRIE) and liftoff of the SOI wafer.  The liftoff process is used to dissolve the insulating layer, thus separating sections of the wafer as individual silicon…

LLNL’s novel approach combines 2-color spectroscopy with CRDS, a combination not previously utilized.