LLNL researchers have developed a method to enhance the performance of polyelectrolyte membranes by using a humidity-controlled crosslinking process which can be applied to precisely adjust the water channels of the membrane.
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For this method, a Silicon on Insulator (SOI) wafer is used to tailor etch rates and thickness in initial steps of the process. The simple three step process approach is comprised of grayscale lithography, deep reactive-ion etch (DRIE) and liftoff of the SOI wafer. The liftoff process is used to dissolve the insulating layer, thus separating sections of the wafer as individual…
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LLNL researchers have developed an alternative route to protective breathable membranes called Second Skin technology, which has transformative potential for protective garments. These membranes are expected to be particularly effective in mitigating physiological burden.
For additional information see article in Advanced Materials “Ultrabreathable and Protective Membranes with Sub-5…