LLNL’s novel approach utilizes a number of techniques to improve reconstruction accuracy:
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Technology Portfolios
![SEM image of a prototype for a neural implant shuttle etched into a non-SOI wafer. The 7:1 (Si:Photoresist) etch selectivity used here allowed for a maximum structure height of 32 μm, with up to 75 steps of 0.4 μm height each. Scale bar 100 μm.](/sites/default/files/styles/scale_exact_400x400_/public/2023-05/SEM%20image%20prototype%20neural%20implant%20shuttle.png?itok=fpnfB5Yr)
For this method, a Silicon on Insulator (SOI) wafer is used to tailor etch rates and thickness in initial steps of the process. The simple three step process approach is comprised of grayscale lithography, deep reactive-ion etch (DRIE) and liftoff of the SOI wafer. The liftoff process is used to dissolve the insulating layer, thus separating sections of the wafer as individual silicon…
![A cold-spray chamber is shown during deposition, with the nozzle at the top of the image and a near-full density sample being fabricated in the center. Particles of the brittle thermoelectric bismuth telluride are accelerated to more than 900 meters per second, or almost Mach 3, in inert gas and directed onto a copper surface, laying down the strips that form the basis of a functioning thermoelectric generator to harvest waste heat. Graphic by Jacob Long/LLNL](/sites/default/files/styles/scale_exact_400x400_/public/2021-02/Cold%20Spray_875x500px.jpg?itok=hjM9UrWO)
![Intensification of laser in simulations and electrons being accelerated](/sites/default/files/styles/scale_exact_400x400_/public/2022-06/intensification%20of%20laser%20in%20simulations%20and%20electrons%20being%20accelerated_875x500px.jpg?itok=bdZS_mHA)
LLNL pioneered the use of tomographic reconstruction to determine the power density of electron beams using profiles of the beam taken at a number of angles. LLNL’s earlier diagnostic consisted of a fixed number of radially oriented sensor slits and required the beam to be circled over them at a fixed known diameter to collect data. The new sensor design incorporates annular slits instead,…
![microcantilever3.jpg microcantilever3](/sites/default/files/styles/scale_exact_400x400_/public/2019-08/microcantilever3.jpg?itok=NKaBhMlG)
LLNL has developed a compact and low-power cantilever-based sensor array, which has been used to detect various vapor-phase analytes. For further information on the latest developments, see the article "Sniffing the Air with an Electronic Nose."