This LLNL invention allows for the fabrication of complex waveplate features and topologies from fused silica, a highly desirable and durable waveplate material. It also is a unique technique for density multiplication and high-fidelity bidirectional deposition, which can create optical components that are generally for entirely new classes of optical materials.
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This LLNL invention concerns a method for patterning the index of refraction by fabricating a spatially invariant metasurface, and then apply spatially varied mechanical loading to compress the metasurface features vertically and spread them radially. In doing so, the index of refraction can be re-written on the metasurface, thus enabling index patterning. This process allows rapid 'rewriting…
This novel invention specifically enables the fabrication of arbitrarily tailored birefringence characteristics in nano-structured meta-surfaces on non-birefringent substrates (e.g. fused silica). The birefringent nano-structured meta-surface is produced by angled directional reactive ion beam etching through a nano-particle mask. This method enables the simultaneous tailoring of refractive…
This invention (US Patent No. 11,294,103) is an extension of another LLNL invention, US Patent No. 10,612,145, which utilizes a thin sacrificial metal mask layer deposited on a dielectric substrate (e.g. fused silica) and subsequently nanostructured through a laser generated selective thermal de-wetting process.
This invention consists of a method of forming nanoscale metal lines to produce a grating-like mask with wide area coverage over the surface of a durable optical material such as fused silica. Subsequent etching processes transfer the metal mask to the underlying substrate forming a birefringent metasurface. This method enables the production of ultrathin waveplates for high power laser…
Heat sensitive materials such as piezoelectric and MEMS devices and assemblies, magnetic sensors, nonlinear optical crystals, laser glass or solid-state laser materials, etc. cannot be exposed to excess temperatures which in the context of this invention, means materials that cannot be exposed to temperatures greater than 50°C (122°F). LLNL’s invention describes a low-temperature method of…
LLNL’s novel approach utilizes a number of techniques to improve reconstruction accuracy:
The method requires specific calibration procedures and control of the hardware, which is achieved through a digital twin…
This novel method of producing waveplates from isotropic optical materials (e.g. fused silica) consists of forming a void-dash metasurface using the following process steps:
